Plasma Etching

Resource responsible:

Djaffar BELHARET
03 81 66 55 83
djaffar.belharet [at] femto-st.fr
Personal page: https://www.femto-st.fr/fr/personnel-femto/djaffarbelharet



RIE-CCP system

Plassys - view the equipment
> Nano-metric & sub-µ etching on variety of materials (dielectrics, SC, piezo-electric ...)

Asher & Surface treatment system

Nanoplas DSB 6000 - view the equipment
> PR stripping
> Surface treatment, prep-aration, functionalization

Multi-material DRIE-ICP system 4’’

STS APS - view the equipment
> Dielectric, isolated & piezo-electric materials etching

Si DRIE-ICP system 6’’

SPTS Rapier Omega C2L - view the equipment
> Si deep, sub-micronic & isotropic etching
> Vias etching

Si DRIE-ICP system 4’’

SPTS Rapier - view the equipment
> Si deep, sub-micronic & isotropic etching
> Vias etching

Si DRIE-ICP system 4’’

Alcatel 601E - view the equipment
> Si deep etching
> Si isotropic etching

Chlorine ICP system 4’’

Trikon Omega 201 - view the equipment
> Metallic materials & SC materials etching