Lithography

Resource responsible:

Laurent ROBERT
03 81 66 66 47
lrobert [at] femto-st.fr

Personal page: https://www.femto-st.fr/fr/personnel-femto/laurentrobert



The Photolithography resource is dedicated to the coating of photoresists which can be used as etching mask or for the deposition of thin films. The design is defined by our optical mask generator.

Spin-coater with integrated hot plate

Solar-Semi OC ST22 - view the equipment
> Photoresists spin coating

Automatic spin-coater, baking and developer

ACS 200 GEN3 - view the equipment
> Adherence promotor
> Photoresist coating
> Photoresist development

Semi-automatic metrology platform

Süss Microtec DSM8 GEN2 - view the equipment
> Top & bottom / Top & top Alignment control 

UV Double-side alignment system

EVG 620 - view the equipment
> Top and bottom side alignments
> Alignment for bonding

DUV Double-side alignment system

EVG 620 - view the equipment
> Top and bottom side alignments

Optical mask generator

HEIDELBERG DWL200 - view the equipment
> Optical masks
> Direct exposure
> 3D photolithography

Spray Coater

Süss Microtec Alta Spray - view the equipment
> Conformal resist coating on substrate with high topology

Semi automatic cleaning system

Solar-Semi QS W300 - view the equipment
> Mask & wafer cleaner