List of the materials used in elaboration :
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Sputtering chamber coupled to an ultrahigh enclosure for temperature resistivity measurement |
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Sputtering chamber coupled to an ultrahigh enclosure for transmission measurement and optical reflection in the visible range |
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UHV enclosure with STM microscope this equipment is used to develop supramolecular self-assemblies on different surfaces and characterization by STM microscopy under ultra-high vacuum Application : Pictures in atomic and / or molecular resolution of conductive surfaces Tab : Elaboration – Characterizations |
| HYMALAYAN Synthesis of thin films in which nanoparticles are incorporated Application : The HYMALAYAN device is a unique process for producing large nanocomposite films combining an aerodynamic jet of nanoparticles with the synthesis of films by magnetron sputtering. The nanoparticles produced using an aerosol generator (chemical process) are injected into the growing film using a set of aerodynamic lenses allowing a controlled trajectory of the particles. This synthesis technique allows the production of films having a large specific surface. The areas of application are colored films, photocatalysis, energy, etc. Tab : Elaboration |
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The PLANAR reactor uses low-pressure cathode arc technology for the development of nano-architectured coatings (monolayer, nanocomposite or nanometric multilayers). They are mainly based on nitrides or transition metal carbides frequently used for applications in extreme environments because of their exceptional mechanical properties. Application : Anti-erosion coatings, resistant to wear and friction, resistant to corrosion and oxidation at high temperature. Tab : Elaboration |
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Elaboration of thin films Application : The UDP850-6 machine is equipped with 6 closed field magnetrons which allows better ionization of the plasma and therefore interesting coating properties; It is an industrial-sized reactor in which it is possible to synthesize metallic and / or ceramic films. The control system allows, independently, the production of single-layer, multi-layer coatings as well as stacking on a nanometric scale on various substrates (ceramics, metals, glasses, etc.). Tab : Elaboration |
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Realization of physical vapor deposition Application : The ALCATEL SCM603 device is a physical vapor deposition machine equipped with 5 magnetrons 150 mm in diameter. This configuration allows the synthesis of multilayer materials, in the form of thin films, consisting of three metallic elements as well as metalloid supplied in gaseous form during the production phase. The materials developed in this reactor are dedicated to various applications. Machine dedicated to industrial service / Metallic deposits (gold; copper; aluminum; chromium; etc.) on all types of substrates (metals, plastics, resins, ceramics, etc.). Tab : Elaboration |
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Synthesis of coating by physical vapor deposition Application : The ALCATEL 604 device is a physical vapor deposition machine equipped with 4 magnetrons 50 mm in diameter. This configuration allows the synthesis of complex materials, in the form of thin films, consisting of four metallic elements as well as metalloid supplied in gaseous form during the production phase. It is possible to increase the number of elements in a film by using multi-element targets. The materials developed in this reactor are dedicated to various applications such as energy, thermoelectricity, catalysis, precious materials (Gold, Platinum ...). Tab : Elaboration |
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Synthesis of coating by physical vapor deposition Application : The ALCATEL SCM650 device is a physical vapor deposition machine equipped with 4 magnetrons 200 mm in diameter. This configuration allows the synthesis of complex materials, in the form of thin films, consisting of four metallic elements as well as metalloid supplied in gaseous form during the production phase. It is possible to increase the number of elements in a film by using multi-element targets. The materials developed in this reactor are dedicated to various applications such as energy, optics, coloring ... Tab : Elaboration |
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Synthesis of coating by physical vapor deposition Application : The ALCATEL SCM450 device is a physical vapor deposition machine equipped with 3 magnetrons 150 mm in diameter. This configuration allows the synthesis of complex materials, in the form of thin films, consisting of three metallic elements as well as metalloid supplied in gaseous form during the preparation phase. It is possible to increase the number of elements in a film by using multi-element targets. The materials developed in this reactor are dedicated to various applications such as energy, optics, etc. Tab : Elaboration |
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Glow discharge spectrometer Application : elementary analysis by volume and surface of samples with the possibility of obtaining the distribution profiles, in depth, of a large number of elements Tab : Elaboration |
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This set of devices allows samples to be shaped before performing a surface treatment or metallographic analysis or using a scanning electron microscope. Application : Surface preparation, metallography, shaping Tab : Elaboration |
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Thin film synthesis using the HIPIMS generator (High Power Impulse Magnetron Sputtering). Study of the influence of the magnetic fields of magnetrons. Application : The BALZERS BAK600 device is a physical vapor deposition machine equipped with two rectangular magnetrons. The magnetrons are powered by a new generation generator that delivers impulse discharges of high power ... Tab : Elaboration |
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The Alcatel A605 machine is a vacuum enclosure in which it is possible to perform plasma treatment using a radio frequency generator; This plasma discharge makes it possible to activate SURFACE. Application : Biomedical Tab : Elaboration |