Resource responsible:

Roland SALUT
03 63 08 21 07
roland.salut [at]
Personal page:

MIMENTO Centre owns two machines enabling the fabrication of submicronic structures. Electron beam lithography enables to nanostructure electron beam resists whereas Focused Ion Beam (FIB) enables to perform localised etchings by means of an ion beam with a very high accuracy.

Electron beam lithography system

Raith E_Line - view the equipment
> Electronic lithography

Focused Ion Beam system

FEI Helios Nanolab 600i - view the equipment
> Ion Beam Lithography
> SEM observation
> 3D reconstruction