MIMENTO technology center has two rooms dedicated to chemistry where six main functions are performed:
- Surface cleaning: acid, base and solvent
- Surface preparation: essentially based on piranha
These two steps of cleaning and preparation are fundamental in the success of a process, because bad cleaning or bad surface preparation can lead to defects in the final results.
- Resist stripping for lift off process
- Wet etching: possibility to etch metals (Al, Ti, Cu, Cr, Ni, Au…) with selective etchants or dielectric as SiO2 with BHF solution
- Si patterns machining with KOH solution
- Electroplating of Ni, Cu or Au
Stirrers, hot plates and ultrasonic tanks complete the wet benches of these two chemistry rooms.
Resource contact:
| Laurent ROBERT 03 81 66 66 47 lrobert [at] femto-st.fr |
Personal page: https://www.femto-st.fr/fr/personnel-femto/laurentrobert |
| Marion VIEIRA 03 63 08 26 56 marion.vieira [at] femto-st.fr |
Personal page: https://www.femto-st.fr/fr/personnel-femto/marionvieira |
Hydrofluoric Acid Bench
| Idonus HF VPE-100 |
Use: > SiO2 and Ti etching > Vapor HF Etching |
 |
Technical specifications |
——
Electroplating Ni system
| Yamamoto station | Use: > Hard mask for etching > Items in nickel > Vias filling > 3", 4" and 6" wafers |
 |
Technical specifications |
——
Chemical benches
| Acid bench Base bench Solvents bench |
Use: > Metals wet etching > Silicon wet etching > Photoresist stripping > Substrates cleaning |
 |
Technical specifications (Acid & solvent bench) Technical specifications (KOH bench) |
——
Realisations
|
|